
MKS - Advanced Processing Equipment Components
MKS as one of the leading manufacturer on instruments that measure, control, power, monitor and analyze critical parameters of vacuum processes using in semiconductors, display, glass coating etc. We are the authorized dealer in Hong Kong, China and Philippines.
Products include:
Category
|
Product |
Application |
Mass Flow Meter
|
For precision gas flow control for vacuum process |
|
Pressure Measurement |
|
For pressure measurement in the process chamber and pumping gas lines of vacuum process such as PECVD |
|
||
Leak Detection |
|
For helium leak check to locate leak in process chamber |
Residual Gas Analysis |
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For in-situ process monitoring such as PECVD |
Vacuum Components |
Vacuum valves (with and without heating) Butterfly valves (for downstream pressure control)
|
General purpose vacuum hardware |
Remote Plasma Source |
|
NF3 remote plasma source for cleaning unwanted deposition on the PECVD chamber wall |
Ozone generator |
|
For wafer surface cleaning and remove the organic materials during the crystalline silicon PV cell production |
Power Supplies |
RF power supply and matching network |
For used in PECVD, plasma edge isolation |









Mass Flow Controller
Baratron® capacitance manometer
Pressure gauge and controller
PICO® helium leak detectors (light weight, only 7.7kg) 
Stainless steel fitting 
ASTRON® Remote Plasma Source
SEMOZON™ ozone gas generators
DC power supply



