Veeco - DLC/PFCA

 

1-016NEXUS DLC-X Diamond-Like Carbon Deposition System..

 

  • Exceptional uniformity, repeatability and film hardness of sub-20A totoal thickness from pulsed filtered cathodic arc
  • Long throw, low pressure PVD provides dense, pin-hole free silicon seed layer
  • Reactive PVD process capable for different seed layer material.
  • Tunable low energy NEXUS 420 ion beam etch source results in stable operation down from 75 volt to 300 volt beam energies to achieve better pre-clean etching, better PTR and topology.
  • Tilting ellipsometer facilitates etch and deposition end point control

 

 


Data Storage

Photovoltaic

Optical Industry

R & D

Semiconductors

General Accessories