CETR – Tabletop CMP / eCMP System

 

CETR is the worldwide leading tribology equipment manufacturer, their most updated model eCP-4 is worldwide unique tabletop type CMP machine which can operate both CMP & eCMP mode. The machine can widely use for research & development of CMP, eCMP processes and the related consumables. The computerized real-time motor-control and data-acquisition allows for a repeatable CMP process with crucial process parameters monitored and analyzed in-situ, real-time:

 

    • Dynamic coefficient of friction between both wafer-pad and conditioner-pad, changes of which allow for evaluation of material removal rate and non-uniformity of polishing,
    • In-situ monitoring of current and voltage during eCMP mode,
    • Energy and peaks of contact high-frequency acoustic emission, which allow for detection evaluation of polishing intensity and detection of micro-scratches and delamination,
    • Process temperature in the slurry and on the pad,
    • Pad wear during conditioning and/or polishing.

     

     

     

     

     


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