Veeco – IBE System

 

Veeco's NEXUS Ion Beam Etching system is ideal for wave guide, laser facets and contact / lead etch applications. This system has the ability to etch III-V compounds, LiNbO3 and SiO2, offering highly selective etching through reactive processing (RIBE and CAIBE). High yields are achieved due to temperature control and ESD control. The system also provides fine end point control and maximum sidewall and roughness control. With excellent uniformity and run-to-run repeatability Veeco's NEXUS Ion Beam Etching system is capable of meeting all of our customers opto electronic device processing requirements.

 

Veeco NEXUS IBE