Beneq Transform® is an ALD cluster tool designed for technology development and manufacturing across power electronics (SiC, GaN, Si), RF, optoelectronics, microLED, MEMS, and sensors. Built for volume production, Beneq Transform scales with throughput and application requirements. It is an ideal platform for applications requiring surface engineering such as surface passivation of wide-band gap materials.
| Beneq Transform® | Beneq Transform® Lite | ||
|---|---|---|---|
| Wafer size | up to 200 mm | up to 200 mm | |
| Max batch Load | 25 wafers | 25 wafers | |
| Process modules | Up to 3 ALD modules + 1 preheating module | Up to 2 ALD modules + 1 preheating module | |
| Wafer Cooling | Built-in | Facet-mounted | |
| Temperature Range | Plasma ALD up to 370 °C; thermal batch up to 420 °C | Plasma ALD up to 370 °C; thermal batch up to 420 °C | |
| Plasma Gas Lines | 2 standard, 2 optional | 2 standard, 2 optional | |
| Liquid source lines | 4 | 4 | |
| Transfer Module | 2 load locks, 4 facets | 1 load lock, 3 facets | |
| Host integration | SECS/GEM, optional 300 mm extension, optional EDA | SECS/GEM, optional 300 mm extension, optional EDA |
By joining hands and leveraging cutting-edge technologies, we develop innovative solutions to drive societal progress and shape a better future.
With deep expertise and extensive experience, we deliver precise and efficient solutions to ensure every project meets the highest standards.
We integrate cutting-edge technology with continuous innovation to develop breakthrough solutions that drive industry progress and create lasting value for our clients.
We offer round-the-clock premium support services, ensuring rapid response and efficient problem resolution, allowing you to focus on your core business without worries.
