Mask alignment system with UV Nanoimprint Lithography capability from small pieces up to 150 mm.
The tool supports a variety of standard lithography processes, such as vacuum-, soft-, hard- and proximity exposure mode, with the option of back-side alignment. In addition, the system offers conventional UV Nanoimprint Lithography (soft UV-NIL) and allows quick processing and re-tooling for changing user requirements with a conversion time between lithography and NIL of just a few minutes. Its advanced multi-user concept can be adapted from beginners to expert level, thus making it ideal for universities and R&D applications.
Features
Technical Data
| Wafer diameter (substrate size) |
| Standard lithography: pieces up to 150 mm |
| Soft UV-NIL: pieces up to 150 mm |
| Resolution |
| ≤ 40 nm (resolution dependent upon template and process) |
| Supported Process |
| Soft UV-NIL |
| Exposure source |
| Mercury light source or UV LED light source |
| Automated separation |
| Not supported |
| Working stamp fabrication |
| External |
By joining hands and leveraging cutting-edge technologies, we develop innovative solutions to drive societal progress and shape a better future.
With deep expertise and extensive experience, we deliver precise and efficient solutions to ensure every project meets the highest standards.
We integrate cutting-edge technology with continuous innovation to develop breakthrough solutions that drive industry progress and create lasting value for our clients.
We offer round-the-clock premium support services, ensuring rapid response and efficient problem resolution, allowing you to focus on your core business without worries.
