The EVG7200 system leverages EVG’s innovative SmartNIL technology enabling manufacturing of micro- and nanostructures with high pattern fidelity and low residual layer. Exposure with tunable intensity is based on LED lamps. The system is capable to quickly solidify a large variety of UV-curable materials improving consequently the throughput. A high yield is obtained by a controlled and smooth demolding supported by a force measurement. Capable of printing nanostructures over a large area with unmatched throughput and low cost of ownership, the EVG7200 system with SmartNIL technology is ideally suited for volume production of next-generation microfluidic and photonic devices, such as diffractive optical elements (DOEs).
*resolution dependent on process and template.
| Wafer diameter (substrate size) |
|---|
| 75 up to 200 mm |
| Resolution |
|---|
| ≤ 40 nm (resolution dependent upon template and process) |
| Supported Process |
|---|
| SmartNIL® |
| Exposure source |
|---|
| High-power narrow-band |
| Alignment |
|---|
| Optional top side alignment |
| Automated separation |
|---|
| Supported |
| Mini environment and climate control |
|---|
| Optional |
| Working stamp fabrication |
|---|
| Supported |
By joining hands and leveraging cutting-edge technologies, we develop innovative solutions to drive societal progress and shape a better future.
With deep expertise and extensive experience, we deliver precise and efficient solutions to ensure every project meets the highest standards.
We integrate cutting-edge technology with continuous innovation to develop breakthrough solutions that drive industry progress and create lasting value for our clients.
We offer round-the-clock premium support services, ensuring rapid response and efficient problem resolution, allowing you to focus on your core business without worries.
