The n&k Olympian series are automated metrology systems used to fully characterize and monitor Thin Film and OCD applications for both current and next generation IC processes. Using an extended spectral range (190 – 15,000nm), the Olympian series monitors the widest array of Thin Film Applications (i.e., BPSG concentration, EPI-Si, SOI, etc.) and Trench/OCD Applications (High Aspect Ratio Structures) in the industry.
Utilizing patented all-reflective optics, a broadband wavelength range (190 – 15,000nm), proprietary optical formulation, and an industry leading signal-to-noise ratio, each system provides the accurate and reproducible data required to monitor subtle changes in critical device parameters (thin film thickness, optical properties, critical dimensions (CD), poly recess profile, sidewall angle) across various key applications.
The n&k Olympian’s thin and thick film applications cover both current and next generation measurement demands for R&D and production: Ultra-Thin Films and Residual Layers, Multi-Layer Stacks, Inhomogeneous Films, 193 nm & 248 nm ARCS and Resists, Low-κ films, High-κ films, films deposited on Rough Surfaces, EPI Film Stacks, and Ultra-Thick Resists.
Experimental reflectance spectra in the IR region measured at three different locations. Low frequency interference fringes are due to BOX thickness; high frequency interference fringes are due to Si device layer thickness.
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