The thin film resistance measurement system can provide highly accurate thickness uniformity measurements for various types of thin films. By employing the innovative multi-sensor fusion measurement technology that combines spectral reflectance technology, near-infrared interferometry technology, and spectral ellipsometry technology driven by high-brightness light sources, it is the only system in China capable of achieving fully automatic detection of homogeneous film thickness.
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We integrate cutting-edge technology with continuous innovation to develop breakthrough solutions that drive industry progress and create lasting value for our clients.
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